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Platinum (Pt) Coated Glass is a high-performance glass substrate coated with a uniform platinum thin film, providing excellent chemical inertness and stable electrical conductivity. Stanford Electronics applies controlled physical vapor deposition, followed by SEM-based surface inspection, to verify coating uniformity and film integrity. This ensures compliance with strict dimensional and compositional requirements for semiconductor processing environments.
Platinum (Pt) Coated Glass consists of a borosilicate glass base uniformly coated with a thin platinum film via physical vapor deposition. The Pt layer provides a chemically inert and electrically conductive surface suitable for demanding semiconductor and microelectronic processes. Tight thickness control supports compatibility with standard fabrication and inspection equipment.
| Parameter | Value |
|---|---|
| Material | Platinum, Borosilicate |
| Purity | Pt: ≥99.99% |
| Form | Substrate |
| Dimensions | 25 × 75 × 1 mm; 22 × 22 × 0.2 mm |
| Adhesion Layer | Titanium (50 Å) |
| Pt Thickness | 1000 Å |
| Coating Area | Single size (or customized) |
The above product information is based on theoretical data and is for reference only. Actual specifications may vary.
Semiconductor Processing
Used as a conductive or barrier layer during wafer fabrication and high-temperature processes.
Supports oxidation-resistant interfaces due to platinum’s chemical stability.
Microelectronics and Sensors
Applied in interconnects and sensor platforms requiring consistent conductivity and low contamination risk.
Suitable for precision devices operating in chemically aggressive or high-temperature environments.
Platinum (Pt) Coated Glass substrates are packaged in anti-static, cushioned containers with moisture-barrier protection to prevent mechanical damage and contamination. Storage in a temperature-stable, clean environment is recommended. Customized packaging options are available upon request.
Platinum-coated glass substrates combine the dimensional stability of glass with the chemical inertness and conductivity of platinum. Advances in PVD control and surface characterization enable reliable, repeatable performance in semiconductor fabrication, microelectronics, and sensor technologies where process stability is critical.
|
Parameter |
Value |
|
Material |
Platinum, Borosilicate |
|
Purity |
Pt: ≥99.99% |
|
Form |
Substrate |
|
Dimensions |
25*75*1 mm, 22*22*0.2 mm |
|
Adhesion Layer |
Titanium (50 Å) |
|
Pt Thickness |
1000 Å |
|
Coating Area |
Single Size (or customized) |
The above product information is based on theoretical data and is for reference only. Actual specifications may vary.
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