All Categories
- All Categories
0
All Categories
- All Categories
Aluminum (Al) Coated Glass is a precision-engineered glass substrate coated with a uniform aluminum thin film to enhance optical and surface functionality. Stanford Electronics employs controlled vacuum deposition processes with routine SEM inspection to verify film thickness and uniformity. This quality-driven approach ensures tight tolerances and reliable performance for semiconductor raw material applications.
Aluminum (Al) Coated Glass consists of a borosilicate glass base with a precisely deposited aluminum thin film. The aluminum layer enhances surface reflectivity and serves as a functional barrier during key semiconductor processes such as photolithography and etching. Controlled deposition ensures consistent film thickness and compatibility with semiconductor manufacturing environments.
| Parameter | Value |
|---|---|
| Material | Aluminum, Borosilicate |
| Purity | Al: ≥99.999% |
| Form | Substrate |
| Dimensions | 25 × 75 × 1 mm; 22 × 22 × 0.2 mm; customized |
| Adhesion Layer | None |
| Al Thickness | 1000 Å |
| Coating Area | Single size (or customized) |
The above product information is based on theoretical data and is for reference only. Actual specifications may vary.
Electronics and Optics
Used as a reflective layer in photolithography to support accurate pattern transfer.
Applied as an optical masking or contrast-enhancing surface in sensor fabrication.
Semiconductor Processing
Serves as a protective or functional surface layer during etching and patterning steps.
Used as a substrate support material where dimensional stability and uniform reflectivity are required.
Aluminum (Al) Coated Glass substrates are packaged in anti-static, moisture-resistant containers with protective foam inserts to prevent mechanical damage and contamination. Temperature-controlled storage is recommended to preserve coating integrity. Custom packaging and labeling options are available upon request.
Metal-coated glass substrates are widely used in semiconductor manufacturing due to their dimensional stability and controlled surface properties. Aluminum thin films, in particular, offer favorable optical characteristics and process compatibility for photolithography and microfabrication. Ongoing advances in deposition and surface analysis continue to improve film consistency and performance across semiconductor and electronic applications.
|
Parameter |
Value |
|
Material |
Aluminum, Borosilicate |
|
Purity |
Al: ≥99.999% |
|
Form |
Substrate |
|
Dimensions |
25*75*1 mm, 22*22*0.2 mm, customized |
|
Adhesion Layer |
None |
|
Al Thickness |
1000 Å |
|
Coating Area |
Single Size (or customized) |
*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.
E-mail address with your company's domain name is preferred. Otherwise, we may not be able to process your inquiry.
Please fill in the required fields.