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InP Semiconductor Manufacturing for 5G Communication

Stanford Electronics supplied high-purity materials and precision solutions to enable efficient Indium Phosphide (InP) wafer processing. This approach helped semiconductor manufacturers reduce costs, improve wafer utilization, and meet the increasing demand for 5G communication infrastructure.

Client A global leader in optical semiconductors
Year 2018
Author Stanford Electronics

Project Overview

The rollout of next-generation communication technologies like 5G has drastically increased the need for high-speed, high-capacity data systems. While traditional silicon semiconductors have been the backbone of the industry, their limitations in handling high-frequency and high-speed applications have driven the adoption of advanced compound semiconductors like Indium Phosphide (InP).

InP is highly valued for its superior electron mobility, low power consumption, and excellent noise performance, making it the material of choice for optical transceiver semiconductor lasers used in 5G networks. However, the high cost of InP wafers poses challenges for manufacturers aiming to scale production while maintaining cost efficiency.


The Problem

Balancing Cost Efficiency and Quality
To address cost pressures, manufacturers increased the die integration rate on InP wafers by reducing the street width (cutting width) to less than 50 μm. This approach maximized wafer material utilization but presented several challenges:

  • Precision Requirements: Narrow street widths demanded highly accurate singulation to prevent damage to surrounding circuits.
  • Material Waste: Traditional methods lacked the precision needed for smaller geometries, resulting in wasted material.
  • Production Inefficiencies: The inefficiency of conventional tools hindered high-volume manufacturing, increasing operational costs.

Manufacturers needed a solution that ensured precise and efficient wafer singulation while maintaining the integrity of the delicate InP material.


The Solution

Materials for High-Precision InP Wafer Processing
Stanford Electronics provided high-purity materials tailored for use in precision wafer singulation processes. These materials were specifically optimized for the soft and delicate properties of InP, ensuring clean, accurate cuts even at ultra-narrow street widths.

Key contributions of Stanford Electronics included:

  1. High-Purity Materials: Ensured consistent performance and clean wafer separation.
  2. Custom Solutions: Materials adapted to the client’s specific production setup, supporting narrow street widths and high die integration.
  3. Scalable Support: Enabled mass production while maintaining precision and quality.

By supplying these materials, Stanford Electronics allowed the client to optimize their existing tools and processes without costly overhauls.


Key Advantages

Driving Efficiency and Versatility
Stanford Electronics’ material solutions delivered significant improvements in wafer processing, including:

  • Increased Wafer Utilization: Narrow street widths maximized the number of dies per wafer, reducing material waste and production costs.
  • Improved Scalability: The consistent quality of materials supported high-volume manufacturing, enabling efficient scaling of production.
  • Material Versatility: Compatibility with other compound semiconductors like GaAs, GaN, and SiC provided flexibility for future applications.

The Result

Efficient InP Wafer Processing for 5G Chips
The implementation of Stanford Electronics’ high-purity materials resulted in:

  • Lower Production Costs: Optimized wafer utilization reduced material waste and operational expenses.
  • Faster Throughput: Improved precision allowed for more efficient singulation processes, increasing production rates.
  • Adoption in 5G Applications: Successfully used in the production of InP-based chips for 5G fronthaul infrastructure, meeting the industry’s growing demand for high-speed communication solutions.
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